pure gas

Gas-filled shock absorber injected with pure N2, which not only keeps stability of damping force, but also reduce aerification and foaming, meanwhile, extend the effective life.

气压式内充入纯氮气，不仅可保持阻尼的稳定性，还可减少油液汽化及泡沫化，延长产品有效寿命。

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The most important step of coal chemical industry, rectisol is a physical acid gas removal process using methanol at subzero temperatures to obtain pure gas.

低温甲醇洗工艺是采用低温甲醇以物理吸收的方法将前段工序变换气中高浓度酸性气体除去，得到纯净气体。

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right. there's more entropy of mixing if you've got a mixture in the liquid than if you have a pure gas up there.

对，最终的熵会更大，如果你把液体混合的话，会比纯物质的熵大。

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Calculating of the Theoretical Temperature of Combustion of Blowing Tuyere in the Co-injection of Natural Gas with Pure Oxygen BF Process

全氧喷吹高氢燃气高炉风口理论燃烧温度的模拟计算

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The determination of SO _ 2 ( sulphur dioxide ) pure gas with iodine quantity method is studied.

研究了用碘量法进行二氧化硫纯气的测定工作.

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the teacher explained the pure gas turbine cycle in class.

老师在课堂上讲解了纯燃气轮机循环。

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This paper discusses calculation method of conductivity of pure gas, mixed gas and liquid alambient pressure.

介绍常压下纯气体及混合气体,加压下纯气体及混合气体以及液体导热系数的计算方法.

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How to get rid of deleterious impurities in the tail gas and get the high pure CO which can produce the high value chemistry engineering products is the basic way of the integrative utilize of yellow phosphorous tail gas.

如何除去尾气中的有害杂质，得到高纯度的CO，生产高附加值的化工产品是黄磷尾气综合利用的基本方向。

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TiN thin film with ( 002) preferred orientation was grown by the DC magnetron sputtering at the condition of pure N_2 reacting gas, 1.6 A of the current of DC sputtering and 500 ℃ of the substrate temperature.

应用直流磁控溅射方法，在500℃的衬底温度、纯氮气的溅射气体、800w溅射功率的条件下制备出（002）择优取向的TiN薄膜。

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Affect of Slops Particles Apparent Density on the Tank Depth for Shallow Tank Flotation Wastewater-treatment Application Of Counter Flowing Gas Floats Filters Pure Water Integrated Technology

浅池气浮净水污粒表观密度对池深的影响逆流式气浮过滤一体化净水技术的应用

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Experiment Research of Desulphurization with Pure Water Bath in SW Type Flue Gas Cleaning Device

SW型烟气净化器纯水水浴脱硫实验研究

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Aluminum-doped zinc oxide ( ZnO ∶ Al) films are deposited on Corning 1737 glass by RF magnetron sputtering under the substrate temperature of 250 ℃, RF power of 100W and pure argon gas.

在Corning1737玻璃衬底上射频磁控溅射沉积了铝掺杂ZnO薄膜（ZnO∶Al）.薄膜沉积在衬底温度250℃、溅射功率100W和纯氩气氛中进行。

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High-frequency plasma ( HFP) as a high power and pure thermal source is used for producing ultra fine powder of sub-micron ZrO 2 and nano-meter ZnO by means of heat decomposition-condensation under high temperature in gas phase.

以高频等离子体（HFP）为高能、纯净热源，采用高温离解&气相冷凝沉积新工艺制备出亚微米级ZrO2及纳米级ZnO等超细粉体材料。

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